[pure-silver] Re: Avoiding pinholes on lith
- From: "J. Stewart" <jrstewart@xxxxxxxxxxxx>
- To: <pure-silver@xxxxxxxxxxxxx>
- Date: Mon, 11 Oct 2004 21:53:33 -0400
Well, I tried full strength D76 to develop the lith film. Lith requires more
strength than D76 provides. The highest density was weak (compared to other
developers at the same exposure), and I still got the pinholes. Actually,
the more I look at the holes, I also see what look like very small
lines/cracks/scratches in the emulsion. Very random patterns.
I have some stock lith film in the freezer. I'll see if I get the same
results. They are the same Arista APHS lith film but a different lot number.
Jim
----- Original Message -----
From: "J. Stewart" <jrstewart@xxxxxxxxxxxx>
To: <pure-silver@xxxxxxxxxxxxx>
Sent: Monday, October 11, 2004 8:37 PM
Subject: [pure-silver] Re: Avoiding pinholes on lith
> Nick, I'm using lith as a mask (specifically a SCIM). In that mask, you
> use
> an interpositive to create a very high constrast SCIM mask: The midtones
> and
> highlights have to be very dense. That's where I see problems with
> pinholes,
> on the densest part of the mask. Even on the interpositive, which is not
> very dense at all, I can see pinholes, but they don't cause a huge
> problem.
>
> When the SCIM mask has pinholes, the final print has an obvious black
> speck
> where the pinholes on the mask are.
>
> Does D72 have less alkalinity than other paper developers? Others advised
> me
> to avoid developers with carbonate. D76/ID11 uses borax instead of
> carbonate... that's why I asked about D76.
>
> To get high constrast with a dilute solution would probably take a long
> time
> (hours??). Thats' why I'm using full strength or 1+1.
>
> Appreciate the interest in my problem.
>
> Jim
>
> ----- Original Message -----
> From: "Nick Zentena" <zentena@xxxxxxxxxxxx>
> To: <pure-silver@xxxxxxxxxxxxx>
> Sent: Monday, October 11, 2004 9:18 AM
> Subject: [pure-silver] Re: Avoiding pinholes on lith
>
>
>> On October 11, 2004 09:11 am, J. Stewart wrote:
>>> Peter, thanks.
>>>
>>> I did try lith developer 1+1 and still got pinholes. This developer has
>>> HQ
>>> and sulfite in Part A and carbonate and hydroxide in Part B (Arista Lith
>>> Developer, I think).
>>>
>>> I have D76/ID 11... it uses borax instead of carbonate. It contains both
>>> metol and HQ... most lith developers have only HQ. I'd like to mix up
>>> something quickly as I have to mail-order all my chemistry and don't
>>> want
>>> to wait.
>>>
>>> I wonder if I could make up a developer with a "lith" concentration of
>>> HQ
>>> but use Borax and sulfite concentrations of D76. Any thoughts on this
>>> approach?
>>>
>>> I searched thru Photo Lab Index but didn't find anything that would
>>> help.
>>
>>
>> I'm curious what you're using the film for? If it's for normal contrast I
>> thought the dilution of D-72 was much higher. 1:10?
>>
>> This developer is designed for lith film and normal contrast.
>>
>> http://members.aol.com/fotodave/Articles/LC-1.html
>>
>> Nick
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