[SI-LIST] IMD and substrate thickness

From: Amitava Bhaduri <bhadhua@xxxxxxxxxxxx>
To: si-list@xxxxxxxxxxxxx
Date: Thu, 13 Nov 2003 11:47:33 -0500 (EST)


Hi,

Can anyone let me know the typical values of the inter-metal-dielectric
thickness (IMD) used in CMOS TSMC0.18 micron technology? Also please let
me know the substrate thickness used in this process, and what are the
typical values of conductivity of the substrate?

Thanks,
Amitava

Amitava Bhaduri
Research Assistant
527 ERC
University of Cincinnati
OH - 45220

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[SI-LIST] IMD and substrate thickness

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