[SI-LIST] Re: [Fwd: [IBIS-Users] static/dynamic overshoot/undershoot definition]
- From: "Beal, Weston" <weston_beal@xxxxxxxxxxx>
- To: "'perry.qu@xxxxxxxxxxx'" <perry.qu@xxxxxxxxxxx>,si-list <si-list@xxxxxxxxxxxxx>
- Date: Mon, 22 Sep 2003 10:47:02 -0700
Perry,
Since this is a noise issue, the location of measurement should be determined
by Si_locaton, a sub-parameter of [Component]. The value can be "Pin" or
"Die". If this sub-parameter is not specified then the EDA tool will make some
assumption so the answer to your question is specific to the tool that you use.
The tools that I'm familiar with assume "Pin" for most simulations.
Regards,
Weston
-----Original Message-----
From: Perry Qu [mailto:perry.qu@xxxxxxxxxxx]
Sent: Monday, September 22, 2003 10:18 AM
To: si-list
Subject: [SI-LIST] [Fwd: [IBIS-Users] static/dynamic
overshoot/undershoot definition]
Hi,
Post this to IBIS reflector and did not get any response. Anyone can
help me to clarify this ?
Thanks
Perry
-------- Original Message --------
Subject: [IBIS-Users] static/dynamic overshoot/undershoot definition
Date: Fri, 19 Sep 2003 09:06:13 -0400
From: Perry Qu <perry.qu@xxxxxxxxxxx>
Organization: Alcatel Canada
To: IBIS group <ibis-users@xxxxxxx>
Hi,
Can someone let me know in IBIS spec, where the static/dynamic
overshoot/undershoot is defined ? At packaging pins or at die ?
Thanks
Perry
--
Perry Qu
Design & Qualification | 600 March Road
Alcatel Canada | Ottawa, ON K2K 2E6, Canada
DID: (613) 7846720 | FAX: (613) 5993642
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