Hi, I'm doing on-wafer measurements of 10-20 GHz silicon circuits. I've found that the repeatability of the measurements is poor due to aluminum oxide formation on the pads. Cascade Microtech and Karl Suss both offer probes which they claim work well with aluminum pads (the Infinity Probe, and the "Z" probe, respectively). Does anyone have experience with either of these probes, or have other suggestions for other suitable wafer probes? Thanks, Brian -- B. Frank, P.Eng. Assistant Professor Department of Electrical and Computer Engineering Tel: 613.533.3063 |||| F: 613.533.6615 ------------------------------------------------------------------ To unsubscribe from si-list: si-list-request@xxxxxxxxxxxxx with 'unsubscribe' in the Subject field or to administer your membership from a web page, go to: //www.freelists.org/webpage/si-list For help: si-list-request@xxxxxxxxxxxxx with 'help' in the Subject field List archives are viewable at: //www.freelists.org/archives/si-list or at our remote archives: http://groups.yahoo.com/group/si-list/messages Old (prior to June 6, 2001) list archives are viewable at: http://www.qsl.net/wb6tpu