[SI-LIST] Re: MOS cap on chip for DECOUPLING

  • From: Rajat Chauhan <rajat@xxxxxxxxxxxx>
  • To: mike_bihan@xxxxxxxxxxxx
  • Date: Thu, 24 Jul 2003 12:03:17 +0530

Hi BH,
I found a good link on MOS Capacitors.

 "http://ece-www.colorado.edu/~bart/book/book/";, Check chapter-6 of this
book.

I myself have not gone through it nicely but check if this can help you.
Thanks 
Rajat

Bi Han wrote:
> 
> Thanks for everyone's valuable inputs.
> 
> That's helpful for understand the mos caps. Because I may have to use it in 
> high speed chip, Can anyone talk something about their high frequency 
> property?
> 
> Thanks!
> BH
> 
> While some gurus have already contributed very good analysis on this issue,
> I would like to contribute to a more subtle one. For some process the N+
> diffusion connected to VCC or P+ connected to VSS may be a problem
> during ESD stress. The reason is the ESD current might be encouraged
> to flow into that diffusion from the substrate/Well and might burn the
> metal contact during ESD stress. This is layout dependent and you have
> to consult your process people about the appropiate layout design rules.
> 
> Regards,
> Raymond
> 
> Bi Han on 23/07/2003 18:50:13
> 
> Please respond to mike_bihan@xxxxxxxxxxxx
> 
> To: List` Si
> cc: (bcc: Raymond Leung/sdc)
> 
> Subject: [SI-LIST] MOS cap on chip for DECOUPLING
> 
> Hi, experts:
> 
> In CMOS technology, what's the difference between using MOS cap as VCC
> decoupling in three different ways?
> 
> 1. NMOS --> gate to VCC, other three nodes to VSS (inversion)
> 
> 2. PMOS --> gate to VCC, other three nodes to VSS (accumulation)
> 
> 3. PMOS --> gate to vss, other three nodes to VCC ( inversion)
> 
> What's their difference in High frequency application such as high speed
> limiting amplifier?
> 
> Thanks!
> 
> ---------------------------------
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-- 
___________________________
RAJAT CHAUHAN
TI-Banglore
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