[SI-LIST] Re: Broadside coupled line vertical registration

  • From: Ed Sayre III <esayre3@xxxxxxxx>
  • To: Mark_Burford@xxxxxxxxxxx
  • Date: Thu, 05 May 2005 10:06:37 -0400

Mark,
   Try using a free ware field solver for this.  It is a simple experiment 
and you will surprised by the results.
   We have done some substantial investigations into this and found that 
the broadside registration is not as sensitive to variations as edge 
coupled spacing and dielectric thicknesses.  Of course the issue is the 
level of coupling for the lines.  The tighter the mutual coupling the more 
critical the registration.  Thus try your stack and see.

Regards
-Ed




At 02:37 PM 5/5/2005 +0100, Mark Burford wrote:
>I have an interesting query, I would like to know what you guru's think
>about the effect of the vertical alignment of a broadside coupled trace
>and the error it could potentially introduce to 2D field solvers and the
>traditional transmission line approximation formulas for calculating Z0,
>C and L.  To clarify: a perfect alignment I am classing as both lines
>exactly stacked one above the other with with core material in the
>centre an no over hang, worst case would be one line being offset to the
>left or right by 50 percent.
>
>Could the potential error introduced be described to a first order by
>decreasing the capacitance by at worst case 0.5?  What would be the 2nd
>order effects?
>
>Your thoughts I am sure will be as diverse as they are interesting.
>
>Thanks guys
>
>Mark Burford=20
>EngD Research Engineer
>
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