[haiku-commits] Re: r35865 - in haiku/trunk: headers/os/interface headers/private/app src/kits/interface src/servers/app src/servers/app/drawing ...

  • From: Stephan Assmus <superstippi@xxxxxx>
  • To: haiku-commits@xxxxxxxxxxxxx
  • Date: Mon, 15 Mar 2010 21:47:55 +0100

On 2010-03-15 at 20:11:05 [+0100], Jonas Sundström <jonas@xxxxxxxxxxx> 
> Stephan Assmus Stephan Assmus <superstippi@xxxxxx> wrote:
>  ...
> > Yes. To clarify for others perhaps, the escapement delta
> > provides a constant extra offset, separately for whitespace
> > and non-whitespace glyphs.
> > The new method allows arbitrary positioning. I.e. in case
> > you want complete control over it, or have to efficiently
> > implement an API which does this itself
> Does this enable arbitrary kerning?
> I think most self-respecting graphics designers expect this
> from their apps. Apps like InDesign and QuarkXpress. To have
> support for this in the OS itself might help us get pro apps
> and pro users.

Yes, it leaves the positioning of glyphs totally to the application. In 
another words, it allows overriding the application server's layouting 

Best regards,

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