The round-trip delay of a 3 inch trace is about 1.1ns. For the 15 inch trace, it's 5.5ns. For risetimes (much) longer than these amounts, the trace could be treated like a lumped load. For faster risetimes, and assuming low-loss etch, you could treat the trace like a 50 ohm load (to the line's previous voltage level) for the duration of the risetime and up to the round-trip delay; and you should NOT treat the trace like its equivalent lumped load. The 3 inch trace with a 1ns risetime is a borderline case. The reflection may appear before the end of the risetime, so it could affect it. Lengthening it to 5 inches may increase the risetime, but above 5 inches, it should have little effect. Of course if you measured your risetime between (say) 10% and 90% of the FINAL value, and if the driver is intended to be reflected-wave or is not very strong, then your results will differ. In that case, longer 50 ohm traces will indeed "slow down" the measured "risetimes" proportionately. Andy ------------------------------------------------------------------ To unsubscribe from si-list: si-list-request@xxxxxxxxxxxxx with 'unsubscribe' in the Subject field For help: si-list-request@xxxxxxxxxxxxx with 'help' in the Subject field List archives are viewable at: //www.freelists.org/archives/si-list or at our remote archives: http://groups.yahoo.com/group/si-list/messages Old (prior to June 6, 2001) list archives are viewable at: http://www.qsl.net/wb6tpu