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[SI-LIST] Broadside coupled line vertical registration
- From: "Mark Burford" <Mark_Burford@xxxxxxxxxxx>
- To: <si-list@xxxxxxxxxxxxx>
- Date: Thu, 5 May 2005 14:37:49 +0100
I have an interesting query, I would like to know what you guru's think
about the effect of the vertical alignment of a broadside coupled trace
and the error it could potentially introduce to 2D field solvers and the
traditional transmission line approximation formulas for calculating Z0,
C and L. To clarify: a perfect alignment I am classing as both lines
exactly stacked one above the other with with core material in the
centre an no over hang, worst case would be one line being offset to the
left or right by 50 percent.
Could the potential error introduced be described to a first order by
decreasing the capacitance by at worst case 0.5? What would be the 2nd
order effects?
Your thoughts I am sure will be as diverse as they are interesting.
Thanks guys
Mark Burford=20
EngD Research Engineer
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