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[SI-LIST] Re: Post Designcon thread
- From: Istvan Novak <istvan.novak@xxxxxxx>
- To: weirsi@xxxxxxxxxx
- Date: Sat, 05 Feb 2005 11:52:00 -0500
Steve, Larry,
The power distribution topic has been steadily growing at DesignCon.
Ten years
ago it was mentioned mostly in keynote speeches as a possible future
problem.
Today, we usually have two tracks and TecForums and panels dedicated to the
subject. In the past years several aspects of the power distribution
topic have
appeared: low-power silicon design, component and PCB characteristics,
measurement approaches and simulation results of various pieces of PDNs.
Very little or none appeared so far on overall PDN methodologies; probably
because this is a very wide-ranging and diverse topic itself, which may not
easily fit into a 30-minute presentation. With a few basic approaches
firming
up in the industry, it may be time to discuss these possibilities in
more detail at
DesignCon. If you are interested, next year we could devote a half-day
TecForum just to discuss power-distribution methodologies. Let me know if
you are interested to participate/contribute.
Best regards,
Istvan
Steve Weir wrote:
>Jim, I had a blast at DesignCon, and want to thank everyone who attended my
>paper.
>
>Larry and company's work on the subject of power delivery has led the way
>for many of us. Introduction by SUN of the F^N method really got a lot of
>people thinking about this issue.
>
>There are trade-offs to both methods, and Larry correctly pointed-out what
>is one of the greatest strengths of the F^N method that he advocates,
>against what may be considered the single greatest weakness of the big "V"
>( single value capacitor ) that I advocate. I think it would be great to
>air-out what both of these methods do and do not do, and then the informed
>reader can use either method properly.
>
>Basically, what is at issue is the anti-resonance that occurs between the
>apparent plane lumped capacitance and the discrete capacitor array in the
>common case of boards that are not huge with high Er power dielectric. The
>advantage that Larry sees to the F^N networks is that is loads the bypass
>network with capacitors in the smallest values. Capacitor ESR depends on
>the package size and the capacitance. So, the upshot is that for a given
>closing frequency and impedance an F^N network has a higher resistance than
>the big "V". Using Larry's 1mohm 100MHz 300pH example with 500pH 0603
>capacitors I get an F^N network with roughly 150uohms versus about 60uohms
>for the big "V". Consequently, plane skin effect aside, the AR Q with the
>planes is about 2.5X times higher than with the F^N method. All thngs
>considered equal, ( such as ignoring plane and at these extremely low
>impedances even via skin effect ) this means the impedance peak at the AR
>with the F^N method will be only about 40% that of the big "V".
>
>At this point, hopefully Larry will chime in if he feels I have gotten
>anything wrong.
>
>My position is that both methods suffer large impedance departures due to
>the AR. The salient questions are: what is the impact, and what can we do
>about it?
>
>Assuming that the AR is well above the IC package power delivery cut-off,
>the AR does not materially affect power quality to the IC die. What it can
>affect is EMC from IC power, as even though the percentage power is way
>down, substantial currents can still flow above the package cut-off. For
>signals running in the offset stripline sandwich, the potential impact is
>increased: signal crosstalk and EMI.
>
>How bad any of these problems are for either method is a matter of
>coefficients. I consider the signal cross talk issue the more serious of
>the problems. We can deal with that problem in two ways: First, reference
>signals correctly so that we do not rely on the ancient CMOS power split at
>the package / PCB boundary, and Second as necessary eliminate large Vcc
>planes. The many voltages commonly needed often already do this to/for us
>anyway.
>
>
> Regards,
>
>
>Steve
>
>
>
>
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